MKS 0190-40602 Remote Plasma Source

MKS 0190-40602 Remote Plasma Source

Product Details Introduction

The MKS 0190-40602 remote plasma source is an efficient plasma source system provided by MKS Instruments, designed specifically for precision material processing applications, particularly in semiconductor manufacturing, thin film deposition, surface treatment, and other processes. It effectively improves work efficiency and provides a stable plasma source by generating plasma remotely.

Main features:

High stability:

This remote plasma source provides stable plasma generation, ensuring high consistency performance in various applications. Its stability is crucial for processes with strict requirements such as semiconductor manufacturing and thin film deposition.

High efficiency:

Its design enables the system to maintain efficient plasma generation at low power, effectively reducing energy consumption while improving the efficiency of the plasma source.

Remote operation:

The plasma generation and regulation process can be controlled remotely, reducing human intervention and simplifying operations.

Low maintenance requirements:

Due to the adoption of advanced design and technology, this remote plasma source has low maintenance requirements and can significantly reduce downtime and maintenance costs.

Flexibility:

MKS 0190-40602 has high flexibility and can adjust its output according to different application needs, suitable for various industrial and scientific research applications.

Product imag

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